• Home
  • Members
  • News
  • About
  • Contact us
  • IBN Cluster
Language
  • lang English
  • lang Nederlands
VRIVRI
  • Home
  • Members
  • News
  • About
  • Contact us
  • IBN Cluster

Fujifilm and imec demonstrate full-color organic light-emitting diodes with photoresist technology for organic semiconductors

3 June 2015 Press articles No Comments

FUJIFILM Corporation (President: Shigehiro Nakajima) (hereafter, “Fujifilm”) and nano-electronics research institute, imec (CEO: Luc Van den hove), have demonstrated full-color organic light-emitting diodes (OLED)*1 by using their jointly-developed photoresist technology*2 for organic semiconductors, a technology that enables submicron*3patterning. This breakthrough result paves the way to producing high-resolution and large organic Electroluminescent (EL) displays and establishing cost-competitive manufacturing methods.

Organic EL displays are increasingly used for televisions, mobile devices including smartphones as well as wearable devices. Since they can be made thin and flexible, while also offering excellent response time and contrast ratio. It is said that today’s products require organic EL displays of high pixel density, i.e. around 200ppi*4 for 4K televisions, 500ppi for full HD mobile devices and even higher density for compact displays for wearable devices. There has been active R&D for organic semiconductors to develop a high-resolution patterning method for organic EL materials to be used in these products.

In 2013, Fujifilm and imec jointly developed photoresist technology for organic semiconductors that enables submicron patterning without damaging the organic semiconductor materials, based on photolithography*5 capable of high-resolution patterning on large substrates. There is no need for additional capital investment since an existing i-line exposure system can be used for the new technology. This is why the technology has attracted wide attention since the development announcement with anticipation of a cost-effective way of manufacturing high-resolution organic semiconductor devices.

In the latest achievement, Fujifilm and imec produced full-color OLEDs with the photoresist technology for organic semiconductors and successfully verified their performance.  Red, green and blue organic EL materials were patterned, each in the subpixel pitch of 20μm*6, to create full-color OLEDs. An OLED array of 40 x 40 dots at the resolution of 640ppi was realized and illuminated with UV rays to confirm that red, green and blue dots separately emitted light. The emission of red, green and blue lights was also confirmed in a test involving the application of voltage rather than illumination, confirming its correct performance.

These results open new opportunities, such as using the novel photolithography in a multiple patterning process. An example would be creating an OLED array that adds a fourth color to red, green and blue, as well as developing previously-unseen devices such as a new sensors that integrate OLED with the organic photodetector*7.

Tags: imec
No Comments
Share
0

You also might be interested in

Imec and Ghent University Demonstrate First Laser Arrays Monolithically Grown on 300mm Silicon Wafers

Oct 29, 2015

Imec and Ghent University present, for the first time, arrays of indium phosphide lasers monolithically integrated on 300mm silicon substrates in a CMOS pilot line. This breakthrough achievement, published in Nature Photonics, provides a path toward high-volume manufacturing of cost-effective photonic integrated circuits (PICs) with monolithically integrated laser sources. Such laser-powered PICs will revolutionize data transfer between future logic and memory chips.

Imec presents successors to FinFET for 7nm and beyond at upcoming VLSI Technology Symposium 2015

Jun 18, 2015

At this week’s VLSI 2015 Symposium in Kyoto (Japan), imec reported new results on nanowire FETs and quantum-well FinFETs towards post-FinFET multi-gate device solutions.

Imec and Tokyo Electron Demonstrate Electrical Advantages of Direct Cu Etch Scheme for Advanced Interconnects

May 20, 2015

Today, at the IEEE IITC conference, nano-electronics research center imec and Tokyo Electron Limited (TEL) presented a direct Cu etch scheme for patterning Cu interconnects. The new scheme has great potential to overcome resistivity and reliability issues that occur while scaling conventional Cu damascene interconnects for advanced nodes.

Leave a Reply Cancel Reply

Categories

  • News (30)
  • Press articles (52)
  • Uncategorized (1)

Recent newsletters

2021 - 1
2020 - 4
2020 - 3

> View all newsletters

Upcoming events

Sorry, there are no upcoming events at this moment.

Recent posts

  • Subscribe to our newsletter
  • Webinar ‘ReThinking NewSpace’: connecting up- to downstream with EO innovation
  • Seminar space economy & job fair (Dutch)

CONTACT

Flemish Space Industry
Berkenrodelei 33, 2660 Hoboken
btw BE 0455.534.170

Tel. +32 477 22 88 67
Fax +32 16 20 06 21
contact@vri.vlaanderen

Projects are supported by the FIT

READ MORE ABOUT

antwerpspace antwerp space ghent university imec newtec OIP Systems vito von Karman Institute xenics
Visit the Flanders Space website

STAY INFORMED

Like and follow us on LinkedIn.

SIGN UP FOR OUR NEWSLETTER

 
 
 
 

© 2026 VRI

Prev Next